Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of re...
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| Language: | English |
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Tokyo :
Springer Japan : Imprint: Springer,
2014.
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| Edition: | 1st ed. 2014. |
| Series: | SpringerBriefs in Applied Sciences and Technology,
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| Online Access: | https://doi.org/10.1007/978-4-431-54795-2 |