Cover Image

Growth of High Permittivity Dielectrics by High Pressure Sputtering from Metallic Targets

This thesis describes the fabrication of metal-insulator-semiconductor (MIS) structures using very high permittivity dielectrics (based on rare earths) grown by high-pressure sputtering from metallic targets. It demonstrates the possibility of depositing high permittivity materials (GdScO3) by means...

Full description

Main Author: Pampillón Arce, María Ángela. (Author, http://id.loc.gov/vocabulary/relators/aut)
Corporate Author: SpringerLink (Online service)
Language:English
Published: Cham : Springer International Publishing : Imprint: Springer, 2017.
Edition:1st ed. 2017.
Series:Springer Theses, Recognizing Outstanding Ph.D. Research,
Subjects:
Surfaces (Physics).
Interfaces (Physical sciences).
Thin films.
Nanotechnology.
Electronic circuits.
Surface and Interface Science, Thin Films.
Electronic Circuits and Devices.
Nanotechnology and Microengineering.
Online Access:https://doi.org/10.1007/978-3-319-66607-5

Internet

https://doi.org/10.1007/978-3-319-66607-5

Similar Items